Liquid crystal display and method of fabricating the same

ABSTRACT

A liquid crystal display including the first and second substrates facing each other and a liquid crystal layer interposed between the first and second substrates is provided. A storage electrode, a transparent insulating layer pattern, and a pixel electrode are formed on the first substrate. A common electrode having a domain divider is formed on the second substrate. The transparent insulating layer pattern includes an opening having a first area having a first width and a second area having a second width narrower than the first width. The domain divider partially overlaps the storage electrode in the second area of the opening of the transparent insulating layer pattern.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims priority from and the benefit of Korean PatentApplication No. 10-2006-0098568, filed on Oct. 10, 2006, which is herebyincorporated by reference for all purposes as if fully set forth herein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a display apparatus. More particularly,the present invention relates to a liquid crystal display using liquidcrystals.

2. Discussion of the Background

A liquid crystal display uses liquid crystals having a mesomorphic phaserepresenting both liquid and crystal properties. The liquid crystaldisplay is provided with two substrates, and a liquid crystal layer,where liquid crystals are aligned, is interposed between the twosubstrates.

When an electric field is applied to the liquid crystals, alignmentdirections of the liquid crystals may be changed, and the lighttransmittance of the liquid crystals may be changed according to thealignment directions of the liquid crystals. Accordingly, the liquidcrystal display may display an image corresponding to the adjusted lighttransmittance.

In most display apparatuses, the quality of an image when viewed in adirection perpendicular to a front surface of the display apparatus issuperior to that of the image when viewed in a lateral direction of thedisplay apparatus. A viewing angle is the range in which a user mayproperly view a displayed image, and a liquid crystal display generallyhas a narrower viewing angle than other display apparatuses. This isbecause the light transmittance may be changed according to thealignment directions of liquid crystals. That is, the image may bedistorted when the user views the image from a lateral side of theliquid crystal display, such that the image quality is degraded.

SUMMARY OF THE INVENTION

The present invention provides a liquid crystal display that may becapable of displaying a high quality image while widening a viewingangle.

The present invention also provides a method of fabricating the liquidcrystal display.

Additional features of the invention will be set forth in thedescription which follows, and in part will be apparent from thedescription, or may be learned by practice of the invention.

The present invention discloses a liquid crystal display including afirst substrate, a second substrate, a liquid crystal layer, a storageelectrode, a first transparent insulating layer pattern, a pixelelectrode, and a common electrode. The first substrate has a pixel areadefined thereon. The second substrate faces the first substrate. Theliquid crystal layer is interposed between the first substrate and thesecond substrate. The storage electrode is disposed on the firstsubstrate. The first transparent insulating layer pattern is disposed onthe storage electrode and includes an opening having a first area havinga first width and a second area having a second width narrower than thefirst width. The pixel electrode is disposed on the first transparentinsulating layer pattern. The common electrode is disposed on the secondsubstrate and has a domain divider that divides the pixel area into aplurality of domains. The domain divider partially overlaps the storageelectrode in the second area of the opening in the first transparentinsulating layer pattern.

The present invention also discloses a method of manufacturing a liquidcrystal display including forming a gate electrode and a storageelectrode, which are spaced apart from each other, on a first substrate.A semiconductor layer pattern is formed on the gate electrode such thatthe semiconductor layer pattern overlaps the gate electrode. A sourceelectrode and a drain electrode, which are spaced apart from each other,are formed on the semiconductor layer pattern. A first transparentinsulating layer is formed on the source electrode and the drainelectrode. A first transparent insulating layer pattern is formed bypatterning the first transparent insulating layer. The first transparentinsulating layer pattern includes an opening having a first area havinga first width and a second area having a second width narrower than thefirst width. A pixel electrode is formed on the first transparentinsulating layer pattern. A common electrode having a domain divider,which divides a pixel area into a plurality of domains, is formed on asecond substrate. A liquid crystal layer is formed between the first andsecond substrates and the first substrate is coupled with the secondsubstrate such that the first substrate faces the second substrates. Thedomain divider partially overlaps the storage electrode, and the openingin the first transparent insulating layer pattern has the second widthin the area where the domain divider overlaps the storage electrode.

It is to be understood that both the foregoing and general descriptionand the following detailed description are exemplary and explanatory andare intended to provide further explanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the invention and are incorporated in and constitute apart of this specification, illustrate embodiments of the invention, andtogether with the description serve to explain the principles of theinvention.

FIG. 1 is a plan view showing a liquid crystal display according to afirst exemplary embodiment of the present invention.

FIG. 2A and FIG. 2B are sectional views taken along line I-I′ of FIG. 1that show an operational process of a liquid crystal display.

FIG. 3 is a sectional view taken along line II-II′ of FIG. 1.

FIG. 4 is a view showing a domain divider of FIG. 1 having a notch toadjust an alignment of liquid crystals.

FIG. 5 is an enlarged view showing an area where the storage electrodeoverlaps the domain divider shown in FIG. 1.

FIG. 6 is a plan view showing a liquid crystal display according to asecond exemplary embodiment of the present invention.

FIG. 7 is a sectional view taken along line III-III′ of FIG. 6.

FIG. 8 is a plan view showing a liquid crystal display according to athird exemplary embodiment of the present invention.

FIG. 9 is a plan view showing a liquid crystal display according to afourth exemplary embodiment of the present invention.

FIG. 10 is a sectional view taken along line IV-IV′ of FIG. 9.

FIG. 11A, FIG. 11B, FIG. 11C, FIG. 11D, FIG. 11E, FIG. 11F, FIG. 11G,FIG. 11H, and FIG. 11I are sectional views showing a method ofmanufacturing a liquid crystal display according to an exemplaryembodiment of the present invention.

FIG. 12A, FIG. 12B, and FIG. 12C are plan views showing various photomasks used in the exposure process shown in FIG. 11E.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

The invention is described more fully hereinafter with reference to theaccompanying drawings, in which embodiments of the invention are shown.This invention may, however, be embodied in many different forms andshould not be construed as limited to the embodiments set forth herein.Rather, these embodiments are provided so that this disclosure isthorough, and will fully convey the scope of the invention to thoseskilled in the art. In the drawings, the size and relative sizes oflayers and regions may be exaggerated for clarity. Like referencenumerals in the drawings denote like elements.

It will be understood that when an element or layer is referred to asbeing “on” or “connected to” another element or layer, it can bedirectly on or directly connected to the other element or layer, orintervening elements or layers may be present. In contrast, when anelement is referred to as being “directly on” or “directly connected to”another element or layer, there are no intervening elements or layerspresent.

FIG. 1 is a plan view showing a liquid crystal display according to afirst exemplary embodiment of the present invention.

Referring to FIG. 1, a first substrate 100 and a second substrate 200,which face each other, are provided. The first substrate 100 has aplurality of pixel areas defined thereon. The pixel areas are basicelements that form an image. All of the pixel areas have the samestructure, and a portion of one selected from among the pixel areas isshown in FIG. 1.

A storage electrode 120 may be formed on the first substrate 100, and apixel electrode 180 may be formed on the storage electrode 120. Thepixel electrode 180 may have a shape corresponding to the pixel area andmay be separately disposed in the pixel area. A common electrode 240 maybe formed on the second substrate 200 corresponding to the pixelelectrode 180. The common electrode 240 may be integrally formed insteadof being divided according to the pixel areas. In the operation of theliquid crystal display, voltages may be applied to the pixel electrode180 and the common electrode 240, respectively.

The common electrode 240 may include a domain divider 250. The domaindivider 250 may be inclined with respect to a row direction and mayextend in first and second directions D₁ and D₂ symmetrical to eachother. A portion of the domain divider 250 extending in the firstdirection D₁ may meet with a portion of the domain divider 250 extendingin the second direction D₂, and the domain divider 250 may be bent inthe meeting area. The portion of the domain divider 250 extending in thefirst direction D₁ and the portion of the domain divider 250 extendingin the second direction D₂ may be inclined at ±45° about the rowdirection.

FIG. 2A and FIG. 2B are sectional views taken along line I-I′ of FIG. 1showing an operational process of the liquid crystal display.

Referring to FIG. 2A, a liquid crystal layer 300 is interposed betweenthe first and second substrates 100 and 200. Transparent insulatinglayer patterns 165 and 170 are formed between the first substrate 100and the pixel electrode 180. The first transparent insulating layerpattern 170 may be provided on the second transparent insulating layerpattern 165. The first and second transparent insulating layer patterns170 and 165 may include organic and inorganic materials, respectively.The first transparent insulating layer pattern 170 may be thicker thanthe second transparent insulating layer pattern 165. The commonelectrode 240, which is on the second substrate 200, may have a cuttingpattern formed by removing a portion of the common electrode 240, andthe domain divider 250 may be defined by the cutting pattern.

The liquid crystal layer 300 may have liquid crystals 310 alignedtherein. The liquid crystals 310 may have an oval shape including a longaxis and a short axis. The alignment direction of the liquid crystals310 is defined as the long-axis direction. When voltages are not appliedto the pixel electrode 180 and the common electrode 240 during theoperation of the liquid crystal display, the liquid crystals 310 may bealigned perpendicularly to the first and second substrates 100 and 200.Light may be provided to the liquid crystal layer 300. In this alignmentstate, the light passes through the liquid crystal layer 300 without aphase variation. Polarizing plates (not shown), which have absorptionaxes perpendicular to each other, may be attached to outer portions ofthe first and second substrates 100 and 200. Accordingly, since thelight is linearly polarized while passing through the polarizing plateattached to the outer portion of the first substrate 100 and thenabsorbed by the polarizing plate attached to the outer portion of thesecond substrate 200, the liquid crystal display apparatus may be in ablack state.

Referring to FIG. 2B, a data voltage corresponding to an image to bedisplayed may be applied to the pixel electrode 180 during the operationof the liquid crystal display. In addition, a constant common voltagemay be applied to the common electrode 240. An electric field may begenerated between the first and second substrates 100 and 200 due to thepotential difference between the data voltage and the common voltage.The liquid crystals 310 have an anisotropic dielectric constant and tiltwith respect to the first and second substrates 100 and 200 according tothe electric field.

In this alignment state, the light provided to the liquid crystal layer300 may be subject to a phase variation according to the alignment ofthe liquid crystals 310 while passing through the liquid crystals 310.The value of the phase variation of the light may change according tothe tilting degree of the liquid crystals 310. In addition, the tiltingdegree of the liquid crystals 310 may be determined according to theintensity of the electric field. Since the light linearly polarized bypassing through the polarizing plate that is attached to the outerportion of the first substrate 100 is subject to phase variation whilepassing through the liquid crystals 310, the light may be output throughthe polarizing plate attached to the outer portion of the secondsubstrate 200. Accordingly, an image having predetermined gray scalesmay be displayed by the output light.

In the above operation, the common voltage is not applied to the domaindivider 250 provided with the cutting pattern. The intensity or thedirection of the electric field may be changed by the domain divider250.

As shown by the dotted line of FIG. 2B, the electric field may be formedto have a curve shape extending from an end portion of the domaindivider 250. The electric field may be symmetrically formed about thedomain divider 250. The liquid crystals 310 may have different alignmentdirections at both sides of the domain divider 250 while being alignedperpendicularly to the direction of the electric field.

The pixel areas may be divided according to the alignment directions ofthe liquid crystals 310 and the divided pixel areas are referred to asdomains. In this case, each pixel area may be divided into a pluralityof domains by the domain divider 250. The liquid crystals 310 may bealigned in various directions in the domains, so that the viewing angleof the liquid crystal display may be widened.

FIG. 3 is a sectional view taken along line II-II′ of FIG. 1.

Referring to FIG. 3, the storage electrode 120 may be formed on thefirst substrate 100. The second transparent insulating layer pattern 165may be formed on the storage electrode 120 to cover the storageelectrode 120. The first transparent insulating layer pattern 170 maypartially cover the storage electrode 120. A storage capacitor is formedby the storage electrode 120, the first and second transparentinsulating layer patterns 165 and 170, and the pixel electrode 180.

The storage capacitor may maintain the data voltage applied to theliquid crystal layer 300 during a predetermined time interval. Themaintenance time interval increases as the capacity of the storagecapacitor increases. The capacity of the storage capacitor increases asthe distance between the storage electrode 120 and the pixel electrode180 decreases. Accordingly, the first transparent insulating layerpattern 170 may be partially opened to define an opening 175 above thestorage electrode 120, and the capacity of the storage capacitor mayincrease by the thickness of the first transparent insulating layerpattern 170.

However, as shown by the dotted line inside the storage electrode 120 ofFIG. 1, the first transparent insulating layer pattern 170 may includean opening 175 having a varying width. In detail, the opening 175 in thefirst transparent insulating layer pattern 170 may have a first width W1corresponding to the storage electrode 120 and a second width W2narrower than the first width W1 corresponding to the area where thestorage electrode 120 overlaps the domain divider 250, such that thestorage electrode 120 is covered.

Accordingly, the vertical distance between the storage electrode 120 andthe pixel electrode 180 increases and the distance between the pixelelectrode 180 and the common electrode 240 decreases in the area wherethe opening 175 has the second width W2. The vertical distance betweenthe pixel electrode 180 and the domain divider 250 decreases and thevertical distance between the pixel electrode 180 and the commonelectrode 240 increases in the area wherein the opening 175 has thefirst width W1.

Since the domain divider 250 may be used to change the electric fieldapplied to the liquid crystal layer 300, the electric field may bedistorted as the distance between the domain divider 250 and the pixelelectrode 180 increases.

If the electric field is distorted, the domain divider 250 may be unableto control the alignment direction of the liquid crystals 310 andtherefore, the alignment of the liquid crystals 310 may be scattered ina corresponding area. To prevent this scattering, the opening 175 may benarrowed in the area where the domain divider 250 overlaps the storageelectrode 120, thereby reducing the distance between the pixel electrode180 and the domain divider 250. In addition, the distance between thestorage electrode 120 and the pixel electrode 180 may be reduced bywidening the opening 175 in the area where the domain divider 250 is notformed, so that the capacity of the storage capacitor may be increased.

FIG. 4 is a view showing a domain divider of FIG. 1 having a notch toadjust the alignment of liquid crystals.

Referring to FIG. 4, the domain divider 250 may have at least one notch255. The notch 255 may be a recess formed by removing a portion of thedomain divider 250. Alternatively, the notch 255 may be a protrusion onthe domain divider 250. As described above, the liquid crystals 310 maybe aligned symmetrically to each other at both sides of the domaindivider 250. However, since there is no unit to adjust the alignmentdirection of the liquid crystals 310 in an area where the domain divider250 is formed, the alignment of the liquid crystals 310 in that area maybe scattered.

The notch 255 may be used to prevent the alignment of the liquidcrystals 310 in the area where the domain divider 250 is formed frombeing scattered. As shown in FIG. 4, the liquid crystals 310 areperpendicular to a surface of the notch 255 when viewed in a plan view.The alignment directions of the liquid crystals 310 derived fromneighboring notches 255 are symmetrical to each other. A singular point256 is formed at a middle point between neighboring notches 255, inwhich the liquid crystals 310 are aligned symmetrically to each otherabout the singular point 256.

The position of the singular point 256 may be adjusted such that theliquid crystals 310 are not arbitrarily aligned in the domain divider250. To this end, the notch 255 may be formed at a preset position, andthe singular point 256 may be positioned at the middle point betweensubstantially neighboring notches 255.

FIG. 5 is an enlarged view showing the area where the storage electrodeoverlaps the domain divider shown in FIG. 1.

Referring to FIG. 5, the domain divider 250 includes a plurality ofnotches 255 formed from the end portion of the storage electrode 120.For the purpose of explanation, two types of notches 255 will bedescribed below. The notch 255 nearest to the storage electrode 120 isreferred to as the first notch 255 a and the remaining notches 255 arereferred to as the second notches 255 b. The same interval may be formedbetween adjacent notches 255 b, that is, the adjacent notches 255 b maybe spaced apart from each other by a second distance d2 in the directionof extending the domain divider 250.

The first notch 255 a may be spaced apart from the second notch 255 badjacent to the first notch 255 a by the second distance d2. Thedistance to the first notch 255 a from an end portion of the firsttransparent insulating layer pattern 170, in which the opening 175 isdefined, is the first distance d1. The first distance d1 may belengthened as the second width W2 of the opening 175 of the firsttransparent insulating layer pattern 170 is narrowed.

As described above, the first transparent insulating layer pattern 170has a step difference in an area corresponding to the opening 175. Thecontrol of the domain divider 250 over the liquid crystals 310 may beweakened in the above area. This is because the liquid crystals 310 maybe inclined with respect to the first substrate 100 along the surface ofthe above area, so the liquid crystals 310 may be aligned in a directiondifferent from a direction controlled by the domain divider 250. Inaddition, the vertical distance to the pixel electrode 180 from thedomain divider 250 in the above area is increased, so the electric fieldapplied to the liquid crystals 310 may be distorted. Accordingly, thecontrol of the domain divider 250 over the liquid crystals 310 may beweakened.

Accordingly, in order to form the singular point 256 at a desiredposition by controlling the liquid crystals 310 using the notches 255,the first distance d1 should be long enough that the first notch 255 ais sufficiently spaced apart from the area in which the control of thedomain divider 250 over the liquid crystals 310 is weakened. In detail,the first distance d1 may be at least 20 μm. In the present exemplaryembodiment, in order to ensure that the first distance d1 is long enoughto control the liquid crystals 310, the width of the first transparentinsulating layer pattern 170 may be reduced in the area where the domaindivider 250 overlaps the storage electrode 120.

The first distance d1 may be identical to the second distance d2. Inthis case, the notches 255 are spaced apart from the end portion of thefirst transparent insulating layer pattern 170, in which the opening 175is defined, at a predetermined interval. Thus, the area in which thedomain divider 250 is formed may be divided at the same interval, exceptfor in the area where the opening 175 in the first transparentinsulating layer pattern 170 is formed. Accordingly, the singular pointsmay be formed at desired positions with a predetermined interval, sothat a high-quality image may be displayed.

FIG. 6 is a plan view showing a liquid crystal display according to asecond exemplary embodiment of the present invention, and FIG. 7 is asectional view taken along a line III-III′ of FIG. 6.

In the present exemplary embodiment, the same reference numerals areassigned to the same elements as those in the first exemplaryembodiment, and detailed descriptions thereof will be omitted below.

Referring to FIG. 6 and FIG. 7, a first substrate 100 and a secondsubstrate 200 facing each other are provided. A plurality of pixelareas, each having the same structure, is defined on the first substrate100. FIG. 6 and FIG. 7 show a portion of one selected from among thepixel areas.

The first substrate 100 is provided with a storage electrode 120, firstand second transparent insulating layer patterns 170 and 165, and apixel electrode 180. The second transparent insulating layer pattern 165covers the storage electrode 120. The first transparent insulating layerpattern 170 has an opening 175 in a predetermined area of the storageelectrode 120 and partially covers the storage electrode 120.

The common electrode 240 having the domain divider 250 is formed on thesecond substrate 200. The domain divider 250 may be inclined withrespect to the row direction of the pixel areas and may extend in firstand second directions D₁ and D₂ symmetrical to each other. A portion ofthe domain divider 250 extending in the first direction D₁ may meet witha portion of the domain divider 250 extending in the second direction D₂on the storage electrode 120. The domain divider 250 may also include aportion extending in the row direction in the meeting area.

Hereinafter, in the domain divider 250, the portion extending in thefirst direction D₁, the portion extending in the second direction D₂,and the portion extending in the row direction are referred to as thefirst portion 251, the second portion 252, and the third portion 253,respectively. In the meeting area of the first and second portions 251and 252, the liquid crystals may be aligned perpendicularly to the firstportion 251 or the second portion 252 under the influence of the firstand second portions 251 and 252. As described above, if the liquidcrystals 310 are under the influence of the first and second portions251 and 252, the alignment of the liquid crystals 310 may be scattered.The third portion 253 may prevent the alignment of the liquid crystals310 from being scattered in the meeting area of the first and secondportions 251 and 252.

As shown in FIG. 6 and FIG. 7, the first transparent insulating layerpattern 170 includes the dual width opening 175. The opening 175 is notformed where the first transparent insulation layer pattern 170 coversthe third portion 253. As described above, if the opening 175 in thefirst transparent insulating layer pattern 170 is disposed in the areawhere the domain divider 250 is formed, the control of the domaindivider 250 over the liquid crystals 310 may be weakened. Accordingly,in order to prevent the control of the domain divider 250 fromweakening, the opening 175 in the first transparent insulating layerpattern 170 is not formed in an area corresponding to the third portion253 of the domain divider 250.

The domain divider 250 may include a protrusion on the common electrode240. The protrusion may include an insulating material and therefore, acommon voltage may not be applied to the area of the protrusion. Theprotrusion may change the intensity or the direction of an electricfield formed between the common electrode 240 and the pixel electrode180. Accordingly, the protrusion may serve the same role as the as acutting pattern of the common electrode 240 in the first exemplaryembodiment. The third portion 253 may also be formed by the cuttingpattern.

FIG. 8 is a plan view showing a liquid crystal display according to athird exemplary embodiment of the present invention.

In the present exemplary embodiment, the same reference numerals areassigned to the same elements as those in the first and second exemplaryembodiments, and detailed descriptions thereof will be omitted below.

Referring to FIG. 8, a first substrate 100 and a second substrate 200facing each other are provided. The first substrate 100 is provided witha storage electrode 120 and a pixel electrode 180. The second substrate200 is provided with a common electrode 240. The common electrode 240includes a domain divider 250.

An insulating layer (not shown) is formed between the storage electrode120 and the pixel electrode 180. The insulating layer has an opening175. The opening may be divided into a portion having a uniform widthand a portion having an irregular width narrower than the uniform width.The portion having the narrower width may correspond to the area wherethe domain divider 250 is bent.

FIG. 9 is a plan view showing a liquid crystal display according to afourth exemplary embodiment of the present invention and FIG. 10 is asectional view taken along line IV-IV′ of FIG. 9.

In the present exemplary embodiment, the same reference numerals areassigned to the same elements as the elements in the first and secondexemplary embodiments, and detailed descriptions of the same elementswill be omitted below in order to avoid redundancy.

Referring to FIG. 9, a first substrate 100 and a second substrate 200are provided. A plurality of pixel areas having the same structure isdefined on the first substrate 100. Each pixel area is formed with apixel electrode 180.

The first substrate 100 may include a gate line 110, a data line 150,and the pixel electrode 180. The pixel electrode 180 may include a firstpixel electrode 181 and a second pixel electrode 182, which are spacedapart from each other. The gate line 110 may include a first gate line111 and a second gate line 112.

The first thin film transistor T1 may be formed on the first gate line111 and the data line 150 and connected to the first pixel electrode181. The first thin film transistor T1 may include a first gateelectrode 111 g branched from the first gate line 111, a first sourceelectrode 151 s branched from the data line 150, and a first drainelectrode 151 d connected to the first pixel electrode 181 through afirst contact hole h1. The first drain electrode 151 d is spaced apartfrom the first source electrode 151 s.

Similarly, the second thin film transistor T2 may be formed on thesecond gate line 112 and the data line 150 and connected to the secondelectrode 182. The second thin film transistor T2 may include a secondgate electrode 112 g branched from the second gate line 112, a sourceelectrode 152 s branched from the data line 150, and a second drainelectrode 152 d connected to the second pixel electrode 182 through thesecond contact hole h2. The second drain electrode 152 d is spaced apartform the second source electrode 152 s.

The storage electrode 120 may be formed on the first substrate 100 andspaced apart from the first and second gate electrodes 111 g and 112 g.The storage electrode 120 may extend over the first and second pixelelectrodes 181 and 182. A storage capacitor may be formed in the areawhere the storage electrode 120 overlaps the pixel electrode 180.

Signals for the operation of the liquid crystal display may betransmitted to the gate line 110 and the data line 150. Data voltageshaving different intensities may be applied to the first and secondpixel electrodes 181 and 182 through the first and second thin filmtransistors T1 and T2 to display an image. Accordingly, the alignment ofthe liquid crystals may be changed on the first and second pixelelectrodes 181 and 182 and different optical characteristics may beexhibited and compensated for in corresponding areas, so the imagequality of the liquid crystal display may be improved.

The pixel electrode 180 may have a symmetrical shape about thelongitudinal direction of the gate line 110 and may extend in a zigzagmanner. The second substrate 200 may be provided with a common electrode240 having a domain divider 250. The domain divider 250 may bepositioned in the center of the pixel electrode 180. The domain divider250 may be formed as a cutting pattern by removing a portion of thecommon electrode 240. The area between the first and second pixelelectrodes 181 and 182 in the pixel electrode 180 may be a cuttingpattern formed by removing a portion of the pixel electrode 180.Accordingly, the domain divider 250 may interact with the area betweenthe first and second pixel electrodes 181 and 182 to divide the pixelarea into a plurality of domains, which may increase the viewing angleof the liquid crystal display.

The domain divider 250 may have a zigzag shape like the pixel electrode180. If the domain divider 250 extends in the same manner as the pixelelectrode 180, the pixel electrodes 180 belonging to neighboring pixelareas may be as close to each other as possible, which may improve theaperture ratio. The domain divider 250 may further include a portionextending in the longitudinal direction of the gate line 110 in additionto the portion extending in a zigzag manner.

Hereinafter, the vertical structure of the liquid crystal display willbe described. However, since the first and second thin film transistorsT1 and T2 are similar to each other when viewed in the verticalstructure, the vertical structure of the second thin film transistor T2will be representatively described below.

Referring to FIG. 10, the second thin film transistor T2 and the storagecapacitor may be formed on the first substrate 100 and may be spacedapart from each other. The second thin film transistor T2 may include agate electrode 112 g, a gate insulating layer 130, a semiconductorpattern 140 having an active pattern 141 and an ohmic contact pattern142, a source electrode 152 s, and a second drain electrode 152 d. Thesecond thin film transistor T2 may be covered by the first and secondtransparent insulating layer patterns 170 and 160, and the pixelelectrode 180 may be formed on the first transparent insulating pattern170.

The second transparent insulating layer pattern 160 may include aninorganic material to protect the second thin film transistor T2. Thefirst transparent insulating pattern 170 may include an organic materialand may have a thickness of several micrometers to increase the verticaldistance between the data line 150 and the pixel electrode 180, whichmay prevent coupling of the data line 150 and the pixel electrode 180.The first and second transparent insulating patterns 170 and 160 may beprovided with a second contact hole h2 to expose the second drainelectrode 152 d.

The first transparent insulating layer pattern 170 having the opening175 may be formed on the storage electrode 120. As shown in FIG. 9, thewidth of the opening 175 varies. In detail, the width of the opening 175narrows in an area where the domain divider 250 bends in a zigzagmanner. The narrowed width of the opening 175 of the first transparentinsulating layer pattern 170 may be uniform. Alternatively, differentfrom FIG. 9, the opening 175 of the first transparent insulating layerpattern 170 may have an irregular width in the area where the width ofthe opening part 175 narrows. The first transparent insulating layerpattern 170 may cover the storage electrode 120 in the area where thedomain divider 250 is formed parallel to the gate line 110.

A light blocking pattern 210, a color filter 220, and an overcoat layer230 may be formed between the second substrate 200 and the commonelectrode 240. The light blocking pattern 210 may block the transmissionof light that is not controlled by the pixel electrode 180. The colorfilter 220 may include red, green, and blue color filters correspondingto three primary colors and may display a color image through thecombination of the three color filters. The overcoat layer 230 mayreduce the step difference between the light blocking pattern 210 andthe color filter 220.

FIG. 11A, FIG. 11B, FIG. 11C, FIG. 11D, FIG. 11E, FIG. 11F, FIG. 11G,FIG. 11H, and FIG. 11I are sectional views showing a method ofmanufacturing the liquid crystal display of FIG. 10 according to anexemplary embodiment of the present invention. Because the first thinfilm transistor T1 has a structure and a manufacturing process similarto those of the second thin film transistor T2, the detailed descriptionthereof will be omitted.

Referring to FIG. 11A, after forming a gate conductive layer on thefirst substrate 100, the resultant structure may be patterned to formthe second gate electrode 112 g and the storage electrode 120. The gateconductive layer may be formed by depositing molybdenum (Mo), copper(Cu), aluminum (Al), silver (Ag), or chrome (Cr)-based metal, alloysthereof, or a multi-layer using a combination of these metals. The gateconductive layer may be etched through a wet etching process usingetchant or a dry etching process using plasma.

Referring to FIG. 11B, the gate insulating layer 130 may be formed onthe second gate electrode 112 g and the storage electrode 120. The gateinsulating layer 130 may include an inorganic compound, for example, asilicon nitride layer. The semiconductor layer 140 a may be formed onthe gate insulating layer 130. The semiconductor layer 140 a may includean amorphous silicon layer. The semiconductor layer 140 a may include anactive layer 141 a and an ohmic contact layer 142 a, which may includeimpurity ions, formed on the active layer 141 a. The gate insulatinglayer 130 and the semiconductor layer 140 a may cover the entire surfaceof the first substrate 100 through a plasma-enhanced chemical vapordeposition method.

A data conductive layer 150 a may be formed on the semiconductor layer140 a. The data conductive layer 150 a may be formed similarly to thegate conductive layer. The first photoresist pattern 10 may be formed onthe data conductive layer 150 a. The first photoresist pattern 10 may beformed by coating a photoresist film on the data conductive layer 150 aand then performing an exposure and development process with respect tothe resultant structure.

The first photoresist pattern 10 may have different thicknessesaccording to the position thereof. The first photoresist pattern 10 mayhave a first thickness t1 in a predetermined area on the second gateelectrode 112 g, and a second thickness t2 thicker than the firstthickness t1 in an area adjacent to the area of the first thickness t1.In addition, the data conductive layer 150 a formed on the storageelectrode 120 may be exposed by the first photoresist pattern 10.

As described above, in order to provide the first photoresist pattern 10with different thicknesses according to the areas thereof, a photo maskenabling halftone exposure for the photoresist film may be used. Forexample, a slit or halftone mask may be used. The slit mask or thehalftone mask may include a transmitting part, a non-transmitting part,and an intermediate transmitting part. The intermediate transmittingpart of the slit mask may include slits, and the intermediatetransmitting part of the halftone mask may include a halftone material.

A portion of light may be transmitted in the intermediate transmittingpart by using the slit or the halftone material and the photoresist filmmay be halftone-exposed. Accordingly, the photoresist pattern may beformed with an intermediate thickness in a portion corresponding to theintermediate transmitting portion. In the present exemplary embodiment,the intermediate thickness corresponds to the first thickness t1.

Referring to FIG. 11C, the data conductive layer 150 a and thesemiconductor layer 140 a may be etched using the first photoresistpattern 10 as an etching mask. Through the above etching process, a dataconductive layer pattern 150 b and a preliminary semiconductor layerpattern 140 b may be formed. The preliminary semiconductor layer pattern140 b may include a preliminary active pattern 141 b and a preliminaryohmic contact pattern 142 b. The preliminary semiconductor layer pattern140 b and the data conductive layer pattern 150 b may be formed usingthe same pattern, such that the preliminary semiconductor layer pattern140 b overlaps the data conductive layer pattern 150 b when viewed in aplan view.

The first photoresist pattern 10 may be uniformly removed by the firstthickness t1 to form the second photoresist pattern 20. The secondphotoresist pattern 20 may have a thickness corresponding to thedifference between the second thickness t2 and the first thickness t1.The data conductive layer pattern 150 b that covers the second gateelectrode 112 g may be exposed by the second photoresist pattern 20.

Referring to FIG. 11D, the data conductive layer pattern 150 b may beetched using the second photoresist pattern 20 as an etching mask. Thedata conductive layer pattern 150 b may be etched to form the secondsource electrode 152 s and the second drain electrode 152 d on thesecond gate electrode 112 g. In addition, the preliminary semiconductorlayer pattern 140 b may be etched to form the semiconductor layerpattern 140. When the preliminary semiconductor layer pattern 140 b isetched, the preliminary semiconductor layer pattern 140 b may be dividedinto two parts to form an ohmic contact pattern 142 and an activepattern 141 at the lower portion of the ohmic contact pattern 142.

As described above, when the second thin film transistor T2 ismanufactured, the semiconductor pattern 140, the second source electrode152 s, and the second drain electrode 152 d may be formed by using thesame photo mask, so that the number of process steps and themanufacturing costs may be reduced.

The first and second transparent insulating layers 170 a and 160 a maybe formed on the second thin film transistor T2. The second transparentinsulating layer 160 a may be formed similarly to the gate insulatinglayer 120. The first transparent insulating layer 170 a may be formed bycoating an organic layer, for example, acrylic resin, on the secondtransparent insulating layer 160 a and then patterning the resultantstructure. The first transparent insulating layer 170 a may havephotosensitivity such that the first transparent insulating layer 170 ais subject to an exposure and development process. The photosensitivitymay be a positive type or a negative type. Hereinafter, the positivetype will be described as an example.

Referring to 11E, the first transparent insulating layer 170 a may beexposed using a photo mask 30. The photo mask 30 may include atransmitting part 31, an intermediate transmitting part 32, and anon-transmitting part 33. As described above, the photo mask 30 havingthe intermediate transmitting part 32 may include a slit mask or ahalftone mask.

FIG. 12A, FIG. 12B, and FIG. 12C are plan views showing various photomasks used for the exposure process shown in FIG. 11E.

Referring to FIG. 12A, the photo mask 30 includes the intermediatetransmitting part 32 and the non-transmitting part 33 adjacent to eachother when viewed in a plan view. The intermediate transmitting part 32includes a plurality of slits 1. The intermediate transmitting part 32corresponds to the opening 175 of the first transparent insulatingpattern 170 on the storage electrode 120 of FIG. 1. The intermediatetransmitting part 32 may have a varying width according to the width ofthe opening 175. A portion of the intermediate transmitting part 32corresponding to a portion of the opening 175 in the first transparentinsulating layer pattern 170 that has a narrowed width may have anarrowed width. For example, when the liquid crystal display shown inFIG. 1 is manufactured, the portion of the transparent insulating layerpattern 170 having the narrower width corresponds to the area where thedomain divider 250 is bent.

Referring to FIG. 12B, the photo mask 30 may have an intermediatetransmitting part 32 and a non-transmitting part 33 that are adjacent toeach other when viewed in a plan view. The intermediate transmittingpart 32 may include a plurality of slits 1 and may be divided into adual-width part and a single-width part. The divided part of theintermediate transmitting part 32 corresponds to a portion of the firsttransparent insulating layer pattern 170 that covers the storageelectrode 120. For example, when the liquid crystal display shown inFIG. 6 is manufactured, the divided part may correspond to an areacovering the portion of the domain divider 250 extending in thelongitudinal direction of the gate line 110.

Referring to FIG. 12C, the photo mask 30 including the intermediatetransmitting part 32 may have a halftone material 2. The intermediatetransmitting part 32 may be divided into a portion having a uniformwidth and a portion having an irregular width narrower than the uniformwidth. The portion of the intermediate transmitting part 32 having thenarrower width may correspond to a portion of the opening 175 in thefirst transparent insulating layer pattern 170 having a narrower width.For example, when the liquid crystal display shown in FIG. 8 ismanufactured, the portion having the narrower width may correspond tothe area where the domain divider 250 is bent. The portion having thenarrower width may narrow as the portion having the narrower widthapproaches the area where the domain divider is bent.

As shown in FIG. 12A, FIG. 12B, and FIG. 12C, the photo mask 30 may havevarious shapes. In other words, the photo mask 30 may include adual-width part of the intermediate transmitting part 32. Accordingly,the shape of the opening 175 in the first transparent insulating pattern170 may correspond to the shape of the intermediate transmitting part32.

Referring to FIG. 11F, the exposed first transparent insulating layer170 a may be developed to form the preliminary first transparentinsulating layer pattern 170 b. The transmitting part 31 may correspondto a predetermined area on the second drain electrode 152 d and thewhole thickness of the first transparent insulating layer 170 a may beremoved in the area to form the contact hole 177. The intermediatetransmitting part 32 may correspond to a predetermined area on thestorage electrode 120 and a predetermined thickness of the firsttransparent insulating layer 170 a may be removed in the area.

Referring to FIG. 11G, the preliminary first transparent insulatinglayer pattern 170 b and the second transparent insulating layer 160 amay be etched. A portion of the preliminary first transparent insulatinglayer pattern 170 b corresponding to the intermediate transmitting part32 may be removed. Then the second transparent insulating layer 160 amay be etched such that the second drain electrode 152 d is exposed.Accordingly, the first and second transparent insulating layer patterns170 and 160 may be formed. The opening 175 in the first transparentinsulating layer pattern 170 may correspond to the intermediatetransmitting part 32. The first and second transparent insulating layerpatterns 170 and 160 may be provided with a second contact hole h2formed therethrough to expose the second drain electrode 152 d.

A transparent conductive layer may be formed on the first transparentinsulating layer pattern 170. The transparent conductive layer may beformed through a sputtering deposition process using indium zinc oxide(IZO) or indium tin oxide (ITO). Then, the transparent conductive layermay be etched to form the pixel electrode 180.

A manufacturing process of the first substrate 100 is described above.Although the second thin film transistor T2 is representativelydescribed through the manufacturing process, the same manufacturingprocess may be employed for the first thin film transistor T1.

Referring to FIG. 11H, the second substrate 200 may be manufacturedindependently from the first substrate 100. After forming a lightblocking layer on the second substrate 200, the resultant structure maybe patterned to form the light blocking layer pattern 210. After forminga photoresist film having a color on the light blocking layer pattern210, the resultant structure may be patterned to form the color filter220. Acrylic resin may be coated on the color filter 220 to form theovercoat layer 230. The transparent conductive layer may be formed onthe overcoat layer 230, and the transparent conductive layer may bepatterned to form the common electrode 240 having the domain divider250.

Referring to FIG. 11I, the first and second substrates 100 and 200 maybe coupled with each other while facing each other. The liquid crystallayer 300 may be formed between the first and second substrates 100 and200. The liquid crystal layer 300 may be formed by injecting liquidcrystals between the first and second substrates 100 and 200 or droppingliquid crystals on one of the first and second substrates 100 and 200.

As described above, the viewing angle of the liquid crystal display maybe widened and the alignment direction of the liquid crystals may bedesirably controlled, which may allow a high-quality image to bedisplayed.

It will be apparent to those skilled in the art that variousmodifications and variations can be made in the present inventionwithout departing from the spirit or scope of the invention. Thus, it isintended that the present invention cover the modifications andvariations of this invention provided they come within the scope of theappended claims and their equivalents.

1. A liquid crystal display, comprising: a first substrate comprising apixel area defined thereon; a second substrate facing the firstsubstrate; a liquid crystal layer interposed between the first substrateand the second substrate; a storage electrode disposed on the firstsubstrate; a first transparent insulating layer pattern disposed on thestorage electrode, the first transparent insulating layer patterncomprising an opening having a first area having a first width and asecond area having a second width narrower than the first width; a pixelelectrode disposed on the first transparent insulating layer pattern;and a common electrode disposed on the second substrate, the commonelectrode comprising a domain divider that divides the pixel area into aplurality of domains, the domain divider partially overlapping thestorage electrode in the second area of the opening of the firsttransparent insulating layer.
 2. The liquid crystal display of claim 1,wherein the opening in the first transparent insulating layer pattern isentirely within the perimeter of the storage electrode.
 3. The liquidcrystal display of claim 1, wherein the domain divider comprises: afirst part extending in a first direction inclined with respect to alongitudinal direction of the storage electrode; and a second partextending in a second direction symmetrical to the first direction aboutthe longitudinal direction of the storage electrode, wherein an endportion of the first part meets an end portion of the second part in anarea where the storage electrode is disposed.
 4. The liquid crystaldisplay of claim 3, wherein the second area of opening in the firsttransparent insulating layer pattern is in the area where the endportion of the first part meets with the end portion of the second part.5. The liquid crystal display of claim 4, wherein the second widthgradually decreases toward the area where the end portion of the firstpart meets the end portion of the second part.
 6. The liquid crystaldisplay of claim 3, wherein the domain divider further comprises a thirdpart that is substantially parallel to the longitudinal direction of thestorage electrode and has an end portion meeting with the end portionsof the first part and the second part.
 7. The liquid crystal display ofclaim 6, wherein the first transparent insulating layer patternpartially covers the third part.
 8. The liquid crystal display of claim3, wherein the pixel electrode extends along the first direction and thesecond direction, and the domain divider is positioned at a center ofthe pixel electrode.
 9. The liquid crystal display of claim 3, whereinthe domain divider has at least one notch spaced apart from the storageelectrode.
 10. The liquid crystal display of claim 9, wherein the notchis spaced apart from the second area of the opening of the firsttransparent insulating layer pattern by a distance of at least 20 μmalong a direction in which the domain divider extends.
 11. The liquidcrystal display of claim 1, further comprising a thin film transistordisposed between the first substrate and the pixel electrode, whereinthe thin film transistor comprises: a gate electrode disposed on thefirst substrate and spaced apart from the storage electrode; an activepattern disposed on the gate electrode; an ohmic contact patterndisposed on the active pattern and overlapping the active pattern exceptin a channel area; and a source electrode and a drain electrode on theohmic contact pattern, the source electrode and the drain electrodeoverlapping the ohmic contact pattern.
 12. The liquid crystal display ofclaim 11, further comprising a second transparent insulating layerpattern interposed between the storage electrode and the firsttransparent insulating layer pattern and covering the storage electrode,wherein the first transparent insulating layer pattern and the secondtransparent insulating layer pattern comprise a contact hole throughwhich the pixel electrode is connected to the drain electrode.
 13. Theliquid crystal display of claim 12, wherein the first transparentinsulating layer pattern is thicker than the second transparentinsulating layer pattern, and the first transparent insulating layerpattern and the second transparent insulating layer pattern comprise anorganic material and an inorganic material, respectively.
 14. The liquidcrystal display of claim 1, wherein the domain divider comprises acutting pattern of the common electrode or a protrusion formed on thecommon electrode.